Nanomechanical mass sensor for spatially resolved ultrasensitive monitoring of deposition rates in stencil lithography.
نویسندگان
چکیده
Francesc Pérez-Murano, Julien Arcamone, Marc Sansa, Jaume Verd, Arantxa Uranga, Gabriel Abadal, Núria Barniol, Marc van den Boogaart and Juergen Brugger 1 Instituto de Microelectronica de Barcelona CNM-IMB (CSIC), Campus UAB, 08193 Bellaterra (Barcelona), Spain. 2 Dept.Electronics Engineering, Universitat Autonoma de Barcelona, ETSE-UAB, 08193-Bellaterra (Barcelona), Spain 3 Microsystems Laboratory (LMIS1), EPFL, EPFL, CH-1015 Lausanne (Switzerland). [email protected]
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ورودعنوان ژورنال:
- Small
دوره 5 2 شماره
صفحات -
تاریخ انتشار 2009